Loading
Sputtering
Unloading
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The barrel sputtering machine is designed with a rotating barrel in which products are loaded for sputtering process. The barrel sputtering process enables high loading quantity and great productivity for loose/small size metallisation.
| Barrel Sputtering– Specification |
Coating Specification :-
1. Coating material: Ti, Cr, Cu, Ni, SUS…
2. Maximum heating temperature: 300°C
3. Residual gas analyser: ULVAC CGM
Application:
1. Metallization for ceramic rod
2. Metallization of ceramic or other material products with small part size
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| Barrel Sputtering– Benefits |
1. High productivity and loading volume for metallization of small size product such as ceramic rod
2. Metallization layer with excellent electronic functional performance compared with wet plating
3. Good thickness uniformity
Barrel Sputtering Machine
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