Photolithography is a key process in microfabrication that uses ultraviolet (UV) light to transfer fine patterns onto a photoresist-coated substrate, usually a silicon wafer. The light alters the chemical properties of the photoresist, allowing for the selective removal of specific areas. These patterned regions then serve as precise templates for processes like etching, doping, or thin-film deposition.

At EPSON, we offer specialized photolithography solutions to support high-precision electroplating and surface finishing. This technique enables us to define micron-level patterns on metal substrates, forming the basis for both functional and decorative applications.

Our in-house photolithography lab operates in a controlled cleanroom environment to ensure contamination-free processing and consistent pattern integrity.

Application

Our photolithography solutions support a wide range of high precision applications, including:

1

Semiconductor Industry: Creates micro-scale patterns that form the basis of integrated circuits and microchips

2

MEMS: Enabling the production of miniaturised mechanical and electronic devices, such as sensors and microfluidic systems

3

Optical Devices: Fabricating specialised optical components that manipulate light, with applications across various fields

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