PVD (PHYSICAL VAPOR DEPOSITION)

Physical vapor deposition (PVD) is a technology where a material is evaporated and condensed to form a thin film coating over an object (substrate). With a wide range of coating materials and thicknesses, PVD can be customized to applications and the coatings can be optimized for various characteristics, such as decorative, optical, electrical, and mechanical properties.

Magnetron sputtering is one of PVD technique, where ionized particle bombard target surface, when energy is high enough, the target atom will be sputtered out. Magnetron sputtering has following advantages:

PVD is used for depositing decorative films on watch casings, jewelry and furniture, as well as for functional films for moulds and dies, cutting tools, and low-friction machine parts. The process delivers a high pass rate and good quality.

■  No environmentally damaging materials and emissions, no toxic reaction products
■  Great variety of coatings can be produced, most substrate can be coated
■  High wear resistance, Low friction coefficient
■  Coating temperature below the final heat treatment temperature of most steels
■  Small, precisely reproducible coating thickness (accurate surface replication, true to size)

PVD has been used to successfully deposit a decorative thin film on SUS and Ti substrates, while functional films such as diamond-like carbon (DLC) film can be prepared and applied to mass production processes such as making gear parts, providing improved wear resistance.

Generic Process Flow

Specifications;

SUS, Titanium, Copper, Zinc, Alloy, etc    

- Hardness: HV200-2000 (Watch Case)

- Corrosion resistance: >48H (High)(Jewellery)

- Roughness: ~0.01 um(Furniture)